Princeton University

School of Engineering & Applied Science

Advances in Nanoimprint Lithography and Applications in Plasmonic-enhanced Electron Source

Yixing Liang
Engineering Quadrangle J401
Thursday, February 6, 2014 - 2:00pm to 3:30pm

My research work focuses on advancements in nanoimprint lithography (NIL) and its application in plasmonic-enhanced nanostructured electron source. It consists of two parts. First, it studies improvements in nanofabrication techniques, including (a) better control of nanostructures, such as line edge roughness and critical structure dimensions, (b) one large area lift-off technique efficient for ultra-thin (sub-40 nm) and ultra-small (sub-20 nm) nanostructure templates, and (c) the reduction of mold-substrate separation force in NIL. Second, a new type of electron source – plasmonic cavity nanostructured electron source – is designed and experimentally demonstrated to be several orders of magnitude more efficient  than electron sources without the designed nanostrucutres. The new electron source is both ultrafast (~ 100 fs) and high efficient, and should find many applications in various fields.